Method of producing a semiconductor device having accurate curre

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 56, H01L 21265, H01L 2170, H01L 2700

Patent

active

055344542

ABSTRACT:
A power DMOS semiconductor device is producible with standard processes and provides improved current detecting accuracy. The device involves main wells (41), subwells (42), and a line well (43), which is independent of the main wells and subwells. These wells are formed by doping the surface of a semiconductor substrate (1) with well forming impurities. The line well surrounds the subwells with a predetermined distance away from the subwells, to relax an electric field on the surface of the substrate. Gate electrodes (71, 72) are patterned to form a line opening (10), which surrounds the subwells. The line opening serves as a mask when forming the line well by doping the surface of the substrate with the well forming impurities. Accordingly, the width of a region between the line well and an adjacent subwell will not fluctuate.

REFERENCES:
patent: 4414560 (1983-11-01), Lidow
patent: 4553084 (1985-11-01), Wrathall
patent: 4783690 (1988-11-01), Walden et al.
patent: 4962411 (1990-10-01), Tokura et al.
patent: 5097302 (1992-03-01), Fujihira et al.
Leipold et al., Experimental Study Of A High Blocking Voltage Power MOSFET With Integrated Input Amplifier, IEEE, 1983, pp. 428-431.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing a semiconductor device having accurate curre does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing a semiconductor device having accurate curre, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a semiconductor device having accurate curre will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1866978

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.