Method of producing a semiconductor device

Details Method of producing a semiconductor device Method of producing a semiconductor device

1980-08-29

1982-09-28

Demers, Arthur P.

Metal treatment

Compositions

Heat treating

29571, 29576B, H01L 21265, H01L 21263

Patent

active

043516742

ABSTRACT:
A region containing a high concentration of impurity and a desired region adjacent thereto are fused by irradiation with a laser beam, to diffuse the impurity in the lateral direction into the desired region and to render the desired region a low resistance.
Since this method can execute only the lateral diffusion of the impurity without affecting other portions, it is very useful for forming a high breakdown voltage MIS-FET, a resistor etc.

REFERENCES:
patent: 4172741 (1979-10-01), Johnson
patent: 4179310 (1979-12-01), Compton et al.
patent: 4212900 (1980-07-01), Serlin
patent: 4229232 (1980-10-01), Kirkpatrick
patent: 4229502 (1980-10-01), Wu et al.
patent: 4230505 (1980-10-01), Wu et al.
patent: 4243433 (1981-01-01), Gibbons
patent: 4249960 (1981-02-01), Schnable et al.
patent: 4267011 (1981-05-01), Shibata
patent: 4268950 (1981-05-01), Chatterjee et al.
patent: 4278475 (1981-07-01), Bartko et al.
Joshi et al., IBM Technical Disclosure Bulletin, vol. 11, Jul. 1968, No. 2, pp. 104-105.
Hutchins et al., IBM Technical Disclosure Bulletin, vol. 16, Jan. 1974, No. 8, pp. 2586-2587.
Baeri et al., Appl. Phys. Lett. 33(2) Jul. 1978, pp. 137-140.
White et al., Appl. Phys. Lett. 33(7) Oct. 1978, pp. 662-664.
Affolter et al., Appl. Phys. Lett. 33(2) Jul. 1978, pp. 185-187.

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