Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1997-03-06
1999-11-23
Nguyen, Nam
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430 22, 356399, 356401, G03C 500, G03F 900
Patent
active
059897627
ABSTRACT:
An alignment correcting method for an aligner is disclosed. A designated number of wafers are selected out of a single lot and have their alignment marks measured in terms of coordinates. Subsequently, a preselected number of wafers are selected out of the wafers undergone measurement in the descending order with respect to closeness to a mean value or a center value of scattering, exposed, and then developed. An alignment correction value is calculated on the basis of the developed wafers.
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NEC Corporation
Nguyen Nam
VerSteeg Steven H.
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