Method of producing a resistor in an integrated circuit

Details Method of producing a resistor in an integrated circuit Method of producing a resistor in an integrated circuit

1994-04-11

1995-05-30

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437918, 148DIG136, H01L 2170, H01L 2700

Patent

active

054200636

ABSTRACT:
The present method of forming a resistor as part of an integrated circuit includes a first masking step which blocks the resistor area of the integrated circuit from plasma etchant, with such plasma etchant meanwhile being used to define small line widths of, for example, metalization. Subsequent thereto, another layer of photoresist is applied to allow wet etching of the area of metalization above the resistor, meanwhile blocking such wet etchant from areas previously plasma etched.

REFERENCES:
patent: 4451326 (1984-05-01), Gwozdz
patent: 5043295 (1991-08-01), Ruggerio et al.

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