Method of producing a porous semiconductor film on a substrate

Etching a substrate: processes – Forming or treating optical article

Reexamination Certificate

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C216S056000

Reexamination Certificate

active

07935263

ABSTRACT:
The invention relates to a method of producing a porous semiconductor film and the film resulting from such production. It furthermore relates to an electronic device incorporating such film and to potential uses of such film.

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