Method of producing a phase shifting mask

Details Method of producing a phase shifting mask Method of producing a phase shifting mask

1992-08-14

1994-04-05

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430323, 430324, G03F 900

Patent

active

053003780

ABSTRACT:
A mask for use in an optical exposure apparatus with single wavelength light includes a light shielding film pattern having two spaced apart portions on a transparent substrate, a transparent thin film for shifting the phase of light transmitted through the mask disposed in the aperture between the light shielding film portions and spaced from the light shielding film portions. The resolution and contrast of the image of the pattern projected onto a wafer are enhanced and the resolution and depth of focus of the photoresist on which the pattern is projected are improved.

REFERENCES:
patent: 4762396 (1988-08-01), Dumant et al.
patent: 4948706 (1990-08-01), Sugihara et al.
patent: 5045417 (1991-09-01), Okamoto
Levenson et al., "Improviding Resolution In Photolithography With A Phase-Shifting Mask", IEEE Transactions On Electron Devices, vol. ED-29, No. 12, Dec. 1982, pp. 1828-1836.
Levenson et al., "The Phase-Shifting Mask II; Imaging Simulations And Submicrometer Resist Exposures", IEEE Transactions On Electron Devices, vol. ED-31, No. 6, Jun. 1984, pp. 753-763.

Affiliated with

Also associated with

Rating

Method of producing a phase shifting mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing a phase shifting mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a phase shifting mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-509971