Method of producing a nanotube layer on a substrate

Details Method of producing a nanotube layer on a substrate Method of producing a nanotube layer on a substrate

2006-04-25

2006-04-25

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical vapor deposition

C427S587000, C427S591000, C427S249100, C427S903000, C118S725000, C423S44500R, C423S447300

Reexamination Certificate

active

07033650

ABSTRACT:
In a method of producing a nanotube layer on a substrate by using a CVD process, the substrate is placed in a reaction chamber, which is flushed with a carbon-containing gas. Subsequently, the substrate is heated by an induction process to a temperature at which carbon from the gas phase is deposited on the substrate while forming nanotubes thereon.

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