Method of producing a multilayer microelectronic substrate

Details Method of producing a multilayer microelectronic substrate Method of producing a multilayer microelectronic substrate

2007-01-02

2007-01-02

Ha, Nguyen T. (Department: 2831)

Electricity: electrical systems and devices

Electrostatic capacitors

Fixed capacitor

C361S311000, C361S313000, C361S321200, C361S321400, C361S306100

Reexamination Certificate

active

10494750

ABSTRACT:
A method of producing a multilayer microelectronic substrate, in which:a) a number of thermally combinable films with a first compression temperature are provided;b) at least one film with a second compression temperature, which lies above the first compression temperature, is provided;c) at least one of the films with the second compression temperature is arranged between films with the first compression temperature;d) the laminated films are heated to the first compression temperature, and further to a first end-temperature until the films with the first compression temperature are completely compressed, the first end-temperature being kept below the second compression temperature; ande) the laminated films are heated to the second compression temperature and, if applicable, further to a second end-temperature in order to compress the at least one film with the second compression temperature,characterized in that at least one of the films is made from magnetodielectric material, with nickel oxide NiO and ferrous oxide Fe2O3 as the main components of a ferrite which contains bismuth oxide Bi2O3 or a eutectic mixture of lead oxide PbO and at least one further metallic oxide or of bismuth oxide Bi2O3 and at least one further metallic oxide.

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