Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1979-10-10
1982-07-20
Gantz, Delbert E.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192P, 204192E, 350276R, 427164, 428148, 428333, 428338, 428339, 428412, 428458, G02B 110, C23C 1500
Patent
active
043402763
ABSTRACT:
A method is disclosed for producing a micro structure on the surface of an article. The method comprises the steps of depositing a discontinuous coating of a material exhibiting a low rate of sputter etching on a substrate exhibiting a higher rate of sputter etching and differentially sputter etching the composite surface to produce a topography of pyramid-like micropedestals random in height and separation. The articles produced by this method are characterized by both the microstructured surface and by the detectable presence of the material exhibiting the lower rate of sputter etching. The microstructured surface results in the articles having uniform antireflecting properties over a large range of angles of incident light and over an extremely broad range of wavelengths, in which the antireflecting characteristic is obtained without an attendant increase in diffuse scattering. Also, the microstructured surface results in the articles being characterized by a high degree of adherence, such that the treated surface may be considered to be "primed", thereby enabling the application of highly adherent coatings or layers thereon.
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Maffitt Kent N.
Willson Richard F.
Alexander Cruzan
Barte William B.
Gantz Delbert E.
Leader William
Minnesota Mining and Manufacturing Company
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