Coating processes – Applying superposed diverse coating or coating a coated base – Metal coating
Patent
1990-09-27
1992-03-17
Beck, Shrive
Coating processes
Applying superposed diverse coating or coating a coated base
Metal coating
156656, 2041921, 4272554, 4272557, 4273761, 4273833, 4274197, 428420, 428698, 428699, B05D 136
Patent
active
050967495
ABSTRACT:
A metallization layer structure containing, in order, an aluminum nitride ceramic base layer, an aluminum titanium nitride layer, a titanium layer, a heat-resistant metallic layer and a metallic layer for facilitating soldering and brazing. The aluminum titanium nitride layer is formed at the interface between the aluminum nitride ceramic base layer and the titanium layer by subjecting a laminate containing, in order, an aluminum nitride ceramic base layer, a titanium layer, a heat-resistant metallic layer and a metallic layer for facilitating soldering and brazing to a heat treatment within the range of 350.degree.-1000.degree. C. for 40 minutes.
REFERENCES:
patent: 2798577 (1957-07-01), Forge, Jr.
patent: 2996401 (1961-08-01), Welch et al.
patent: 3057445 (1962-10-01), Bronnes
patent: 3107756 (1963-10-01), Gallet
patent: 4461799 (1984-07-01), Gavrilov et al.
patent: 4503130 (1985-03-01), Bosshart et al.
patent: 4611745 (1986-09-01), Nakahashi et al.
patent: 4695517 (1987-09-01), Okuno et al.
patent: 4761345 (1988-08-01), Sato et al.
patent: 4770953 (1988-09-01), Horiguchi et al.
patent: 4818626 (1989-04-01), Werdecker et al.
Chemical Abstracts, vol. 107, No. 20, Abstract No. 182020q, Nov. 1987, p. 382.
Harada Shigeki
Sugimoto Masahiro
Beck Shrive
Fujitsu Limited
Owens Terry J.
LandOfFree
Method of producing a metallization layer structure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing a metallization layer structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a metallization layer structure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1474933