Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2003-08-19
2008-08-19
Huff, Mark F. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C451S036000, C451S041000, C065S060100, C065S061000, C427S160000, C427S165000, C427S292000, C051S308000
Reexamination Certificate
active
07413832
ABSTRACT:
In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of a polishing liquid having a pH value between 7.0 and 7.6 that contains abrasive grains, and the abrasive grains include colloidal silica abrasive grains produced by hydrolysis of an organosilicon compound. The polishing process includes a surface roughness control step for initially finishing the surface of the glass substrate to a predetermined surface roughness by moving a polishing member and the glass substrate relative to each other under a predetermined pressure. This is followed by a protrusion suppressing step, carried out immediately before the end of the polishing process, under a pressure lower than the predetermined pressure, to minimize polishing rate and suppress occurrence of a fine convex protrusion. A mask blank and then a transfer mask are formed from this polished glass substrate.
REFERENCES:
patent: 5429730 (1995-07-01), Nakamura et al.
patent: 5581345 (1996-12-01), Oki et al.
patent: 5868953 (1999-02-01), Maekawa et al.
patent: 6020109 (2000-02-01), Okamoto et al.
patent: 6027669 (2000-02-01), Miura et al.
patent: 6126518 (2000-10-01), Jacquinot et al.
patent: 6265115 (2001-07-01), Berkey et al.
patent: 6277465 (2001-08-01), Watanabe et al.
patent: 6346352 (2002-02-01), Hayden et al.
patent: 6626967 (2003-09-01), Takami et al.
patent: 2002/0004173 (2002-01-01), Berkey et al.
patent: 2002/0110743 (2002-08-01), Shoki et al.
patent: 2003/0228461 (2003-12-01), Yoshikawa et al.
patent: 10-40267 (1989-02-01), None
patent: 01040267 (1989-02-01), None
Grant, Roger and Claire, Grant & Hackh's Chemical Dictionary, Fifth Edition, 1987, McGraw-Hill, Inc., pp. 261 and 487.
Koike Kesahiro
Miyagaki Junji
Hoya Corporation
Huff Mark F.
Ruggles John
Sughrue & Mion, PLLC
LandOfFree
Method of producing a glass substrate for a mask blank,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing a glass substrate for a mask blank,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a glass substrate for a mask blank,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4000315