Method of processing substrate, method of manufacturing...

Details Method of processing substrate, method of manufacturing... Method of processing substrate, method of manufacturing...

2006-02-21

2009-11-24

Chen, Kin-Chan (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C216S059000

Reexamination Certificate

active

07622392

ABSTRACT:
A method of processing a substrate that enables the amount removed of an insulating film to be controlled precisely, without damaging an electronic device. An insulating film on a substrate of a solid-state imaging device is exposed to an atmosphere of a mixed gas containing ammonia and hydrogen fluoride under a predetermined pressure. The insulating film that has been exposed to the atmosphere of the mixed gas is heated to a predetermined temperature.

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