Method of processing substrate, method of forming film, and...

Details Method of processing substrate, method of forming film, and... Method of processing substrate, method of forming film, and...

2005-03-29

2005-03-29

Santiago, Mariceli (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

With start up, flashing or aging

C445S024000

Reexamination Certificate

active

06872112

ABSTRACT:
To attain an increase in production speed and suitable for mass production in a substrate processing operation such as film formation requiring a hermetic atmosphere. A substrate processing method for performing a predetermined processing on a substrate is provided, which includes the steps of: arranging a surface of the substrate to be processed in a hermetic atmosphere; evacuating said hermetic atmosphere; and performing a predetermined processing on the substrate, in which the processing step is conducted after moving the evacuated hermetic atmosphere from the station for evacuation to a ifferent station.

REFERENCES:
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patent: 5622634 (1997-04-01), Noma et al.
patent: 5871587 (1999-02-01), Hasegawa et al.
patent: 6083566 (2000-07-01), Whitesell
patent: 6179678 (2001-01-01), Kishi et al.
patent: 6344711 (2002-02-01), Ohnishi et al.
patent: 7-235255 (1995-09-01), None
patent: 8-171849 (1996-07-01), None

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