Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or... – Developer
Patent
1993-07-09
1994-08-30
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Nonradiation sensitive image processing compositions or...
Developer
430434, 430446, 430464, 430486, G03C 529
Patent
active
053427416
ABSTRACT:
A developer composition having improved stability to aerial oxidation, which contains at least one compound represented by formulae (A) and (B): ##STR1## where R.sub.1 and R.sub.2 each represent a hydroxyl group, an amino group, an acylamino group, an alkylsulfonylamino group, an arylsulfonylamino group, an alkoxycarbonylamino group, a mercapto group or an alkylthio group; and X represents a group of atoms selected from carbon and nitrogen which forms a 5-membered or 6-membered ring together with the two vinyl carbons substituted by R.sub.1 and R.sub.2, respectively, and the carbonyl carbon of formula (A); ##STR2## where R.sub.3 and R.sub.4 each represent a hydroxyl group, an amino group, an acylamino group, an alkylsulfonylamino group, an arylsulfonylamino group, an alkoxycarbonylamino group, a mercapto group or an alkylthio group; and Y represents a group of atoms selected from carbon, nitrogen and oxygen containing at least one ether bond, and Y forms a 6-membered ring together with the two vinyl carbons substituted by R.sub.3 and R.sub.4, respectively, and the carbonyl carbon of formula (B), provided that both R.sub.3 and R.sub.4 are not hydroxyl.
REFERENCES:
patent: 3512981 (1970-05-01), Prchal et al.
patent: 3664835 (1972-05-01), Youngquist
patent: 3870479 (1975-03-01), Kubotera et al.
patent: 3876427 (1975-04-01), Okutsu et al.
patent: 4264716 (1981-04-01), Vincent et al.
patent: 5064751 (1991-11-01), Ohki et al.
patent: 5217842 (1993-06-01), Kojima et al.
patent: 5254436 (1993-10-01), Koga et al.
Hayakawa Hiroshi
Morimoto Kiyoshi
Morishima Shin-ichi
Fuji Photo Film Co. , Ltd.
Le Hoa Van
LandOfFree
Method of processing silver halide photographic material and com does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of processing silver halide photographic material and com, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of processing silver halide photographic material and com will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-29283