Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1999-03-29
2000-01-25
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430311, G03F 900
Patent
active
060176636
ABSTRACT:
A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.
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Total Molecular Base Real Time Monitor [TMB], Extraction Systems Inc.
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Joe C. Vigil, et al.--"Contamination Control for Processing DUV Chemically Amplified Photoresists" Advances in Resist Technology and Processing XII, Santa Clara, CA, USA, Feb. 20-22, 1995, ISSN 0277-786X, Proceedings of the SPIE--The International Society for Optical Engineering, 1995, USA, pp. 626-643.
Patent Abstracts of Japan, vol. 018, No. 566 (E-1622), Oct. 28, 1994 & JP 06 208947 A (Toshiba Corp.), Jul. 26, 1994.
Kakazu Yuji
Kanzawa Keiko
Katano Takayuki
Kawakami Yasunori
Park Jae Hoon
Tokyo Electron Limited
Young Christopher G.
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