Method of processing photographic light-sensitive material

Details Method of processing photographic light-sensitive material Method of processing photographic light-sensitive material

1995-03-29

1997-01-07

McFarlane, Anthony

Radiation imagery chemistry: process, composition, or product th

Regenerating image processing composition

Developer

430448, 430264, 430611, 430613, 430488, 430963, G03C 518, G03C 526, G03C 106

Patent

active

055915671

ABSTRACT:
A method of processing a photographic light-sensitive material comprising a backing layer on a support opposite an emulsion layer comprises the steps of exposing the material, developing the exposed material with developer, the developer being replenished with developer replenisher in an amount of not more than 200 ml per m.sup.2 of the material, and fixing the developed material,

REFERENCES:
patent: 3432298 (1969-03-01), von Rintelen et al.
patent: 4737442 (1988-04-01), Yagihara et al.
patent: 4914003 (1990-04-01), Yagihara et al.
patent: 5081009 (1992-01-01), Tanemura et al.
patent: 5258280 (1993-11-01), Suzuki
patent: 5385811 (1995-01-01), Hirano
patent: 5415973 (1995-05-01), Inoue
patent: 5457009 (1995-10-01), Toyoda et al.

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