Method of processing dummy pattern based on boundary length...

Details Method of processing dummy pattern based on boundary length... Method of processing dummy pattern based on boundary length...

2011-03-01

2011-03-01

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Integrated circuit design processing

Physical design processing

C716S118000, C716S119000

Reexamination Certificate

active

07900177

ABSTRACT:
A method of placing a dummy pattern in a wiring region includes calculating a density of a wiring pattern in the wiring region and calculating a value of a length of a periphery of the wiring pattern. The dummy pattern is then set such that a total of the pattern density and the value of the length of the periphery of the wiring pattern and the dummy pattern in the wiring region falls within specified ranges in the wiring region.

REFERENCES:
patent: 7062732 (2006-06-01), Ito et al.
patent: 7171645 (2007-01-01), Ito et al.
patent: 2004/0102034 (2004-05-01), Ito et al.
patent: 2004/0139412 (2004-07-01), Ito et al.
patent: 2000-277615 (2000-10-01), None
patent: 2002-198435 (2002-07-01), None
Scagnelli et al.,“Pattern Density Methodology Using IBM Foundry Technologies”, May 2007, 57thElectronic Components and Technology Conference, Proceedings pp. 1300-1307.

Affiliated with

Also associated with

Rating

Method of processing dummy pattern based on boundary length... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of processing dummy pattern based on boundary length..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of processing dummy pattern based on boundary length... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2644921