Etching a substrate: processes – Etching and coating occur in the same processing chamber
Reexamination Certificate
2007-10-16
2007-10-16
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Etching and coating occur in the same processing chamber
Reexamination Certificate
active
11088261
ABSTRACT:
This invention relates to a method of processing a workpiece in a chamber. Initially a surface of the workpiece is treated by a process which includes supplying a reactive gas to the chamber through a first gas supply and the surface is then further treated using a process gas supplied to the chamber through a second gas supply during the supply of the process gas so that a portion of the process gas flows into the first gas supply from the chamber to mitigate against residual reactive gas entering the chamber during the further treatment step.
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Burgess Stephen Robert
Price Andrew
Aviza Technology Limited
Olsen Allan
Volentine & Whitt PLLC
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