Method of processing a substrate utilizing specific chuck

Details Method of processing a substrate utilizing specific chuck Method of processing a substrate utilizing specific chuck

1998-03-18

1999-11-23

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430296, 430942, 430966, 279 3, G03F 900

Patent

active

059897600

ABSTRACT:
A substrate (10) having a central region (32) and a peripheral region (34) is processed using a chuck (40) that contacts peripheral regions (34) of the substrate but not the central region. A fabrication step is performed while the substrate (10) is on the chuck (40, 60, 70). The chuck can be used in the formation of a lithographic mask or a semiconductor device.

REFERENCES:
patent: 4357006 (1982-11-01), Hayes
patent: 4603867 (1986-08-01), Babb et al.
patent: 5632854 (1997-05-01), Mirza et al.
J.A Liddle et al., "Mask fabrication for projection electron-beam lithography incorporating the Scalpel technique", J. Vac. Sci. Technol. B, vol.9, No. 6, Nov./Dec. 1991.
S.D. Berger et al., "Projection electron-beam lithography: A new approach", J. Vac. Sci. Technol. B, vol.9, No. 6, Nov./Dec. 1991.

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