Method of processing a substrate

Details Method of processing a substrate Method of processing a substrate

2007-05-15

2007-05-15

Sarkar, Asok Kumar (Department: 2891)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C257SE21237

Reexamination Certificate

active

11088199

ABSTRACT:
There is disclosed a method of processing a substrate, which comprises applying a surfactant or a water soluble polymer agent onto a surface of a substrate to be processed, and sliding a circumferential portion of the substrate and a polishing member against each other to polish the circumferential portion of the substrate.

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