Method of processing a photosensitive material and photosensitiv

Details Method of processing a photosensitive material and photosensitiv Method of processing a photosensitive material and photosensitiv

1994-10-05

1996-05-21

Huff, Mark F.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430401, 430494, 430140, 430501, 430496, 430347, 430644, 354 21, 354 75, 354 76, 354105, 354298, 354331, G03C 700, G03D 300

Patent

active

055188443

ABSTRACT:
In a first processing step, whether a first photosensitive material is a particular photosensitive material is detected. If it is detected at least that the first photosensitive material is the particular photosensitive material, processing conditions in the first processing step are recorded in a predetermined position on the first photosensitive material. Exposure conditions in the exposure step are set in accordance with one of the result of the detection and the processing conditions recorded on the first photosensitive material. The second photosensitive material is exposed under the set exposure conditions. If the first photosensitive material is detected to be a particular photosensitive material, the setting of the exposure conditions is changed in the exposure step, and the exposure conditions are set in such a manner as to compensate the difference in the characteristic occurring in the image of the particular first photosensitive material depending on standard processing and particular processing. Accordingly, even in the case of a photosensitive material requiring particular processing, it is possible to form an image of fixed quality.

REFERENCES:
patent: 5101225 (1992-03-01), Wash et al.
patent: 5187518 (1993-02-01), Kitagawa
patent: 5344730 (1994-09-01), Kitamoto
patent: 5382508 (1995-01-01), Ikenoue

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