Method of preventing mask tone error

Details Method of preventing mask tone error Method of preventing mask tone error

1996-05-16

1997-03-25

Dang, Trung

Fishing, trapping, and vermin destroying

437 34, 437924, 148DIG137, 430 5, H01L 2166

Patent

active

056144202

ABSTRACT:
A method is described for checking masks used for the ion implantation steps in the manufacture of semiconductor integrated circuit element wafers before these masks are used for wafer processing. The masks being checked are segmented and the tone, clear or dark, is described by a numerical or logical value assigned to each segment. Mathematical operations on the data representing each mask are carried out and the results are compared with values expected from masks which are error free. Results From the mathematical operations on data representing masks which do not agree with the expected results indicate a high probability of error in those masks. The masks are then checked carefully and errors corrected before using the masks in wafer processing.

REFERENCES:
patent: 4247203 (1981-01-01), Levy et al.
patent: 4532650 (1985-07-01), Wihl et al.
patent: 5436097 (1995-07-01), Norishima et al.

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