Method of pretreating an underground formation for silicon polyh

Details Method of pretreating an underground formation for silicon polyh Method of pretreating an underground formation for silicon polyh

1981-05-14

1983-02-08

Novosad, Stephen J.

Wells

Processes

Separate steps of fracturing or attacking formation

166292, 166300, E21B 33138

Patent

active

043723853

ABSTRACT:
The formation is consolidated by means of a silicon halide compound that reacts with water present on the walls of the formation pore space thereby forming silicon dioxide that bonds the formation grains together. The bonding strength is increased by a pretreatment of the formation grains with an acid in liquid or gaseous form.

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patent: 3743020 (1973-07-01), Suman, Jr. et al.
patent: 3929192 (1975-12-01), Friedman
patent: 4061191 (1977-12-01), Meijs et al.

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