Method of preparing zinc oxide film

Details Method of preparing zinc oxide film Method of preparing zinc oxide film

1982-01-05

1983-10-18

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C23C 1500

Patent

active

044104081

ABSTRACT:
A method of making zinc oxide film comprises the steps of forming a zinc oxide layer on a substrate by carrying out radio-frequency sputtering with a target of zinc oxide, forming a zinc oxide layer on said zinc oxide layer by carrying out reactive, direct-current or radio-frequency sputtering with a target of zinc metal.

REFERENCES:
patent: 4336120 (1982-06-01), Sakakura et al.
Mamio et al., Vertical Electrode Configuration to Avoid Contaminating Particles in Sputtered ZnO Thin Film, Vacuum, vol. 28, No. 12, pp. 529-532, 1978.
Ohji et al., New Sputtering System for Manufacturing ZnO Thin-Film SAW Devices, J. Vac. Sci., Technol. 15(4) Jul./Aug. 1978, pp. 1601-1604.

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