Method of preparing Tl-containing oxide superconducting thin fil

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Coating

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505500, 505501, 505730, 505731, 505732, 505742, 427 62, 4271263, 4274192, 4274193, 4272557, B05D 512

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053766270

ABSTRACT:
Provided herein is a method of efficiently preparing a thin film having a higher critical temperature as to an oxide superconducting material containing Tl. A thin film of an oxide containing Tl is formed and then heat treated at a temperature of about 850.degree. to 950.degree. C. for a short time, and thereafter further heat treated at a temperature, which is lower than the preceding heat treatment temperature, of at least about 750.degree. C. for a long time. The thin film is heat treated in an atmosphere having an oxygen partial pressure of not more than about 0.1 atm. In formation of a Tl superconducting thin film, on the other hand, a 1212 phase layer is reacted with an amorphous Ca--Cu--O layer to form a 1223 phase layer, or a layer containing volatile metal elements (Tl, Bi and Pb, for example) and oxygen is reacted with another layer containing other elements than the volatile metal elements to form a superconducting film having a high critical temperature.

REFERENCES:
Lee et al, "Low-temperature formation of epitaxial Tl.sub.2 Ca.sub.2 Ba.sub.2 Cu.sub.3 O.sub.10 thin films in reduced O.sub.2 pressure", Appl. Phys. Lett. 60(6) Feb. 1992, pp. 772-774.
Subramanyam et al, "Fabrication and Chemical Composition of rf magnetron sputtered Tl-Ca-Ba-Cu-O high Tc superconducting thin films", J. Appl. Phys. 68(3), Aug. 1990, pp. 1157-1163.
Hong et al, "Properties of superconducting Tl.sub.2 Ba.sub.2 Ca.sub.2 Cu.sub.3 O.sub.10 Film by sputtering", Thin Solid Films, 181 (1989) pp. 173-180.
Naziripour et al, "Tl-Ba-Ca-Cu-O superconducting thin films with postdeposition processing using Tl-containing thin films as Tl source", J. Appl. Phys. 70(10), Nov. 1991, pp. 6495-6497.
Liu et al, "Formation of Superconducting (Tl,Bi)Sr.sub.2 CaCu.sub.2 O.sub.y thin films by rf sputtering and thallium diffusion", Appl. Phys. Lett. 56(21) May 1990, pp. 2135-2137.

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