Method of preparing quarternary ammonium formulations with high

Details Method of preparing quarternary ammonium formulations with high Method of preparing quarternary ammonium formulations with high

1993-01-19

1995-05-09

O'Sullivan, Peter

Organic compounds -- part of the class 532-570 series

Organic compounds

Amino nitrogen containing

564291, 564296, C07C20912

Patent

active

054141249

ABSTRACT:
A quaternary ammonium compound solution comprising from about 50% to about 80% of a quaternary ammonium compound and from about 20% to about 50% of a solvent. The solvent being from about 25% to about 100% of alkylene glycol with the remainder being water. The method of making quaternary ammonium compounds comprises reacting methyl chloride and/or benzyl chloride and dialkylmethylamine and/or alkyldimethylamine in an alkylene glycol to completion and diluting the same with sufficient water to a solution in which the alkylene glycol is from about 25% to about 100% of the solvent component of the total solution and the quaternary ammonium compound is from about 50% weight to about 80% weight of the quaternary ammonium compound solution.

REFERENCES:
patent: 3472939 (1969-10-01), Petrocci et al.
patent: 3525793 (1970-08-01), Petrocci et al.
patent: 3836669 (1974-09-01), Dadekian et al.
patent: 4165375 (1979-08-01), Berger et al.
patent: 4238373 (1980-12-01), Hardy et al.
patent: 4320147 (1982-03-01), Schaeufele
patent: 4444790 (1984-04-01), Green et al.
patent: 4450174 (1984-05-01), Green et al.
patent: 4464398 (1984-08-01), Sheets et al.

Affiliated with

Also associated with

Rating

Method of preparing quarternary ammonium formulations with high does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of preparing quarternary ammonium formulations with high , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of preparing quarternary ammonium formulations with high will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1706680