Coating processes – Measuring – testing – or indicating
Patent
1978-06-16
1980-02-05
Smith, John D.
Coating processes
Measuring, testing, or indicating
252514, 427125, 427217, 428403, 428469, 429219, H01M 454, H01M 604
Patent
active
041873289
ABSTRACT:
A positive active material for electric primary cells, such as are used in electronic watches, is formed from a powder composed at least partially of grains having cores of silver peroxide completely surrounded by a layer of monovalent silver oxide and covered with a thin surface layer of metallic silver. The remainder of the powder, if any, comprises monovalent silver oxide grains, also covered with a thin surface layer of metallic silver. A process for making the material includes adding a reducing agent such as hydrazine to a powder having grains of less than 50 microns in diameter of essentially pure silver peroxide and reducing the silver peroxide to the point at which a thin layer of metallic silver forms on the surface of each powder grain. This point can be detected by a substantial reduction in electrical resistivity of the powder and occurs when approximately one-half of the original powder remains as silver peroxide.
REFERENCES:
patent: 3663276 (1972-05-01), Allington et al.
patent: 4009056 (1977-02-01), Megahed et al.
patent: 4015056 (1977-03-01), Megahed et al.
patent: 4034126 (1977-07-01), Funakoshi et al.
patent: 4038467 (1977-07-01), Lippold et al.
patent: 4048402 (1977-09-01), Kronenberg
patent: 4048405 (1977-09-01), Megahed
Frenkel Stuart D.
Saft-Societe des Accumulateurs Fixes et de Traction
Smith John D.
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