Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Patent
1994-02-10
1995-05-16
Powell, William
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
252 793, 252 794, B44C 122, C03C 1500
Patent
active
054157315
ABSTRACT:
A method of preparing a non-glare glass comprising (a) applying a printing ink consisting of water, sugar, carboxymethyl cellulose, starch powder, and aluminum oxide on the surface of the glass by means of a conventional screen printing technique; (b) dipping the glass into a dipping solution consisting of water, sugar, ammonium bifluoride, and ferric chloride; and (c) washing the glass thus treated with water. The resulting glass has a number of fine, transparent, etched patterns on its surface, and thus, can scatter light applied to the surface in a random manner, resulting in a non-glare surface. The process produces a glass having a non-glare surface, on which various and exquisite patterns are etched, without causing environmental pollution or injury to workers.
REFERENCES:
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patent: 2622016 (1952-12-01), Gilstrap et al.
patent: 3616098 (1971-10-01), Falls
patent: 4781792 (1988-11-01), Hogan
patent: 4921626 (1990-05-01), Rhodenbaugh
patent: 5281350 (1994-01-01), Gimm et al.
Kim Hyang Wung
Kim Jung Hyung
Powell William
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