Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or...
Patent
1991-07-29
1995-01-10
Wright, Lee C.
Radiation imagery chemistry: process, composition, or product th
Nonradiation sensitive image processing compositions or...
430546, 430631, 430634, 430635, 430636, 210634, 210644, 210799, 252314, G03C 7388
Patent
active
053806280
ABSTRACT:
Fine particle photographic coupler dispersions are prepared by forming a dispersion of a photographic coupler, coupler solvent and auxiliary coupler solvent in an aqueous gelatin medium containing at least about 1% by weight of an anionic surfactant selected from the group consisting of alkali metal salts of alkarylene sulfonic acids, alkali metal salts of alkyl sulfates, alkaryl sulfonate salts, and alkyl sulfosuccinates; and washing the dispersion with water for a time sufficient to remove at least one-fourth of the surfactant.
REFERENCES:
patent: 2949360 (1960-08-01), Julian
patent: 3860425 (1975-01-01), Ono et al.
patent: 3936303 (1976-02-01), Shiba et al.
patent: 4233397 (1980-11-01), Tada et al.
patent: 4291113 (1981-09-01), Minamizono et al.
patent: 4385110 (1983-05-01), Yoneyama et al.
patent: 5013640 (1991-05-01), Bagchi et al.
patent: 5015564 (1991-05-01), Chari
patent: 5024929 (1991-06-01), Lougheed et al.
patent: 5135844 (1992-08-01), Bagchi et al.
PCT International Search Report, PCT/US/92/06225.
Journal of Medicinal Chemistry, vol. 18, No. 9, Sep. 1975, pp. 865-868, A. Leo et al., "Calculation of Hydrophobic Constant . . . Constants".
Sawyer John F.
Zengerle Paul L.
Eastman Kodak Company
Rice Edith A.
Wright Lee C.
LandOfFree
Method of preparing coupler dispersions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of preparing coupler dispersions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of preparing coupler dispersions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-850039