Method of preparing a high-purity polycrystalline silicon using

Details Method of preparing a high-purity polycrystalline silicon using Method of preparing a high-purity polycrystalline silicon using

1986-10-30

1990-02-13

Doll, John

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415745, 423348, 423349, 427213, C01B 3302, B05D 700

Patent

active

049004115

ABSTRACT:
Method and apparatus for the preparation of high-purity polycrystalline silicon deposited by thermal decomposition or hydrogen reduction of a gaseous halogenated silicon on high-purity silicon particles in a fluidized bed reactor heated by microwave.

REFERENCES:
patent: 4292344 (1981-09-01), McHale
patent: 4416913 (1983-11-01), Ingle et al.
patent: 4435374 (1984-03-01), Helm
D. J. DeLong: "Advances in Dichlorosilane Epitaxial Technology", Solid State Tech., Oct. 1972.
J. F. Franz: "Design for Fluidization" Chemical Engineering, Oct. 1, pp. 89-96 (1962).
Chemical Engineers Handbook, 5th edition, 1973, Perry et al., pp. 20-64.

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