Method of posttreating the focal track of X-ray rotary anodes

Details Method of posttreating the focal track of X-ray rotary anodes Method of posttreating the focal track of X-ray rotary anodes

1992-05-05

1993-09-21

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427256, 427367, 4273831, 427555, B05D 136

Patent

active

052467422

ABSTRACT:
The invention relates to a method of producing an X-ray rotary anode having a focal track region composed of refractory metals. The focal track region is manufactured by means of powder-metallurgy methods or by means of CVD or PVD methods. According to the invention, the focal track region is posttreated using high-energy electrons or photons by means of local, superficial melting to a depth of less than 1.5 mm. This reduces, in particular, the residual porosity in the focal track region. That results in improved mechanical properties, higher X-ray yield and markedly improved service life of such rotary anodes.

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