Method of positioning an electrooptic probe of an apparatus for

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

324751, G01R 2912

Patent

active

055527167

ABSTRACT:
An method of positioning an E-O probe applied to an apparatus for the measurement of voltage. In the first step, the relative position of the E-O probe against the magnifying optical system in the first condition of being focused the magnifying optical system on the base of the E-O probe, and the focal point difference between the focal plane of the magnifying optical system in the second condition that the E-O probe is substantially out of the optical path for observation of the surface of the device and the focal plane in the first condition are stored. The relative position and the focal point difference are fixed in the apparatus for the measurement of voltage regardless of the device to be measured. Next, in the second step, the focus of the magnifying optical system is adjusted to the observation position of the surface of the device in the second condition, and then in the third step, the magnifying optical system, the E-O probe, and the probe stage are separated from the device by the focal point difference stored in the first step by the Z-axis stage, and in the fourth step, the E-O probe is moved to the relative position of the E-O probe stored in the first step relative to the magnifying optical system by the probe stage.

REFERENCES:
patent: 4446425 (1984-05-01), Valdmanis et al.
patent: 4618819 (1986-10-01), Mourou et al.
patent: 5274325 (1993-12-01), Shinagawa et al.
Patent Abstracts Of Japan, vol. 10, No. 371 (P-526) Dec. 11, 1986 & JP-A-61 165 607 (Hitachi) Jul. 26, 1986.
Shinagawa et al, "An Automated Optical On-Wafer Probing System for Ultra.varies.High-Speed ICs", International Test Conferene 1992, Sep. 1992, pp. 834-839.
Nagatsuma, "Measurement of High-Speed Devices and Integrated Circuits Using Electro-optic Sampling Technique", IEICE Transactions On Electronics, vol. E76-C, No. 1, Jan. 1993, pp. 55-63.
Aoshima et al, "Non-Contact Picosecond Electro-Optic Sampling Utilizing Semiconductor Laser Pulses", SPIE Ultra High Speed and High Speed Photography, Photonics, and Videography '89, vol. 1155, 1989, pp. 499-510 (Month Unavailable).
Tadao Nagatsuma, "Measurement Of High-Speed Devices And Integrated Circuits Using Electro--Optic Sampling Technique", IEICE Trans, Electron, vol. E76-C, No. 1, Jan. 1, 1993, pp. 55-63.
Tadao Nagatsuma, "Subpicosecond Sampling Using A Noncontact Electro-Optic Probe", J. Appl. Phys. 66(9), Nov. 1, 1989, pp. 4001-4009.
Mitsuru Shinagawa et al, "A Laser-Diode-Based Picosecond Electrooptic Prober For High-Speed LSI'S", IEEE Transactions On Instrumentation and Measurement, vol. 41, No. 3, Jun. 3, 1992, pp. 375-380.
Janis A. Valdmanis et al, "Subpicosecond Electrooptic Sampling: Principles And Applications", IEEE Journal of Quantum Electronics, vol. QE-22, No. 1, Jan. 1986, pp. 69-78.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of positioning an electrooptic probe of an apparatus for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of positioning an electrooptic probe of an apparatus for , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of positioning an electrooptic probe of an apparatus for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1952995

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.