Coating processes – Nonuniform coating
Reexamination Certificate
2004-03-25
2008-10-07
Culbert, Roberts (Department: 1792)
Coating processes
Nonuniform coating
C264S405000
Reexamination Certificate
active
07431970
ABSTRACT:
An atomic force microscopy polymer nanolithography method is described. The method of the present invention enables rapid creation of raised or depressed features in a polymer film. The features are generated by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters of polymer by Joule heating. This localized softening of the polymer is accomplished by current flow between the AFM tip and a conductive wafer upon which the layer of polymer is mounted.
REFERENCES:
patent: 5729026 (1998-03-01), Mamin et al.
patent: 5808302 (1998-09-01), Binnig et al.
patent: 5856967 (1999-01-01), Mamin et al.
patent: 6249747 (2001-06-01), Binnig et al.
patent: 6391217 (2002-05-01), Schaffer et al.
Sergei F. Lyuksyutov et al. “Electrostatic Nanolithography in Polymers Using Atomic Force Microscopy” Published online, Jun. 22, 2003.
Juhl Shane
Lyuksyutov Sergei
Vaia Richard
AFMCLO/JAZ
Culbert Roberts
Lambert Richard A.
United States of America as represented by the Secretary of the
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