Method of polishing silica base ceramics

Abrasive tool making process – material – or composition – With inorganic material – Clay – silica – or silicate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

51309, B24D 302

Patent

active

044339801

ABSTRACT:
Disclosed is a chemical polishing compound for silica based ceramics.

REFERENCES:
patent: 3715842 (1973-02-01), Tredinnick et al.
patent: 3768989 (1973-10-01), Goetzinger et al.
patent: 4226623 (1980-10-01), Koshiyama et al.
Reinhold, V. N., The Condensed Chemical Dictionary, 8th Ed. 1971, p. 829.
"Mechanism and Application of the `Mechanochemical Polishing Method Using Soft Powder`;" Nobuo Yasunaga, Noboru Tarumi, Akira Obara.
"Mechanochemical Polishing of Single Crystals with Soft Powders", Nobuo Yasunaga, Akira Obara and Osamu Imanaka.
"A New Polishing Technique Using the Mechano-chemical Phenomenon", Nobuo Yasunaga, Osamu Imanaka.
"New Concepts on Surface Finishing and its Application to Ceramics--Recent Progress in Ultra-Fine Finishing in Japan--", Osamu Imanaka, Mamoru Okutomi.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of polishing silica base ceramics does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of polishing silica base ceramics, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of polishing silica base ceramics will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-757730

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.