Method of polishing langasite

Details Method of polishing langasite Method of polishing langasite

1994-09-26

1997-02-25

Rose, Robert A.

Abrading

Abrading process

Utilizing fluent abradant

451 41, 1566251, B24B 100

Patent

active

056054904

ABSTRACT:
A piezoelectric material langasite, having a defect free surface is obtai by polishing the surface of the material with a colloidal silica suspension diluted with water to about 10 to 30% concentration by weight and etching the surface of the polished piezoelectric material in an approximate 1:50:150 solution of HCl:HF:H.sub.2 O at about 70.degree. C.

REFERENCES:
patent: 3897628 (1975-08-01), Hanak et al.
patent: 5480476 (1996-01-01), Cook et al.
patent: 5494849 (1996-02-01), Iyer et al.

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