Method of polishing implantable medical devices to lower...

Details Method of polishing implantable medical devices to lower... Method of polishing implantable medical devices to lower...

2011-06-28

2011-06-28

Norton, Nadine G (Department: 1713)

Etching a substrate: processes

Nongaseous phase etching of substrate

C216S011000, C216S037000, C216S088000, C216S041000, C427S541000, C623S001150, C623S001380

Reexamination Certificate

active

07967998

ABSTRACT:
The present invention relates to a method of polishing an implantable medical device. The method may include positioning an implantable medical device on a support. At least a portion of a surface of the implantable medical device may include a polymer. A fluid may be contacted with at least a portion of the surface of the positioned implantable medical device. In an embodiment, the fluid may be capable of dissolving at least a portion of the polymer at or near the surface of the implantable medical device. The method may further include allowing the fluid to modify at least a portion of the surface of the positioned medical device. A majority of the contacted fluid may be removed from the surface of the implantable medical device. In certain embodiments, the modified portion of the surface may be substantially less thrombogenetic and substantially more mechanically stable than an unmodified surface.

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