Method of polishing hard crystal substrate

Details Method of polishing hard crystal substrate Method of polishing hard crystal substrate

2007-11-28

2010-11-09

Rose, Robert (Department: 3727)

Abrading

Abrading process

Glass or stone abrading

C451S037000

Reexamination Certificate

active

07828628

ABSTRACT:
A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

REFERENCES:
patent: 5207759 (1993-05-01), Mehmandoust et al.
patent: 5942015 (1999-08-01), Culler et al.
patent: 7374473 (2008-05-01), Kumasaka et al.
patent: 7585341 (2009-09-01), Kumasaka et al.
patent: 2007/0010098 (2007-01-01), Brusic et al.
patent: 2008/0200098 (2008-08-01), Moeggenborg et al.

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