Method of polishing glass substrate

Abrading – Abrading process – Utilizing fluent abradant

Reexamination Certificate

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Details

C065S061000, C430S005000, C451S041000, C451S056000, C451S057000, C451S060000

Reexamination Certificate

active

08070557

ABSTRACT:
An object of the present invention is to provide a polishing method for diminishing concave defects of a glass substrate used in a reflective mask for EUVL and the like. The invention relates to a method of polishing a glass substrate which comprises polishing a major surface of the glass substrate while feeding a polishing slurry between the glass substrate and a pad surface of a polishing pad, wherein the polishing load of the polishing pad is from 1 to 60 g/cm2. The pad surface of the polishing pact is preferably dressing-processed.

REFERENCES:
patent: 6576380 (2003-06-01), Davis, Jr. et al.
patent: 6931097 (2005-08-01), Davis, Jr. et al.
patent: 2004/0035153 (2004-02-01), Koike et al.
patent: 2007/0066066 (2007-03-01), Kojima et al.
patent: 2008/0311487 (2008-12-01), Ito et al.
patent: 11-335979 (1999-12-01), None
patent: 2003-505891 (2003-02-01), None
patent: 2003-211351 (2003-07-01), None
patent: 2004-098278 (2004-04-01), None
patent: 2006-035413 (2006-02-01), None
patent: 2006-075914 (2006-03-01), None
patent: 2006-165323 (2006-06-01), None
patent: 2007-058200 (2007-03-01), None
U.S. Appl. No. 12/635,872, filed Dec. 11, 2009, Kojima, et al.

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