Method of polishing a surface of copper or an alloy comprising m

Abrading – Abrading process – Glass or stone abrading

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451 28, 451 36, B24B 100

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active

056225253

ABSTRACT:
Method of polishing a surface (5a) of copper or an alloy comprising mainly copper, in which a polishing means is moved across the surface while exerting a polishing pressure of approximately 500 g/cm.sup.2 for obtaining a plane and smooth polished surface without any defects. A composition of a polishing component comprising a colloidal suspension of SiO.sub.2 particles having an average particle size of between 20 and 50 nm in an alkali solution, demineralized water and a chemical activator is used as a polishing means.

REFERENCES:
patent: 3485608 (1969-12-01), Cecil
patent: 3662500 (1972-05-01), Mendel
patent: 4057939 (1977-11-01), Basi
patent: 5096854 (1992-03-01), Saito et al.
patent: 5230833 (1993-07-01), Romberger et al.
patent: 5352277 (1994-10-01), Sasaki

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