Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2004-02-05
2009-11-24
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
C427S249100, C427S249800, C427S249120
Reexamination Certificate
active
07622151
ABSTRACT:
Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber; vaporizing the liquid precursor; and subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr.
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patent: 6284315 (2001-09-01), Tzeng
patent: 05097583 (1993-04-01), None
Tzeng, et al.; Effects of oxygen and hydrogen on electron field emission from microwave plasma chemically vapor deposited microcrystalline diamond, nanocrystalline diamond, and glassy carbon coatings.
Auburn University
Gambetta Kelly M
Haverstock & Owens LLP
Meeks Timothy
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