Data processing: structural design – modeling – simulation – and em – Modeling by mathematical expression
Reexamination Certificate
2007-06-19
2007-06-19
Rodriguez, Paul (Department: 2123)
Data processing: structural design, modeling, simulation, and em
Modeling by mathematical expression
C382S144000, C382S145000, C382S149000, C356S237100, C356S511000, C356S139070
Reexamination Certificate
active
10348031
ABSTRACT:
A method of level assist feature OPC layout is described using frequency model-based approach. Through low-pass spatial frequency filtering of a mask function, the local influence of zero diffraction energy can be determined. By determining isofocal intensity threshold requirements of an imaging process, a mask equalizing function can be designed. This provides the basis for frequency model-based assist feature layout. By choosing assist feature parameters that meet the requirements of the equalizing function, through-pitch focus and dose matching is possible for large two dimensional mask fields. The concepts introduced also lead to additional assist feature options and design flexibility.
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FitzGerald Esq. Thomas R.
Hiscock & Barclay LLP
Rodriguez Paul
Thangavelu Kandasamy
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