Method of photolithographically treating a substrate

Details Method of photolithographically treating a substrate Method of photolithographically treating a substrate

1983-10-03

1985-07-16

Smith, John D.

Coating processes

Electrical product produced

Condenser or capacitor

427 96, 427259, 430327, 430935, H01L 21312

Patent

active

045296189

ABSTRACT:
The invention relates to a method of photolithographically treating a substrate, in which a surface of the substrate is treated at least at the area at which it consists of an inorganic material with an organosilicon compound.
In order to improve the adhesion of a photolacquer layer to be applied, the organosilicon compound used is a 3-aminopropyl-trialkoxysilane in the form of an aqueous solution.

REFERENCES:
patent: 3788895 (1974-01-01), Schimmer
patent: 3827908 (1974-06-01), Johnson
patent: 4103045 (1978-07-01), Lesaicherre
Noll, Chemistry and Technology of Silicones, Academic Press, .COPYRGT.1968, pp. 174-179.

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