Method of patterning transparent conductive film, thin film...

Details Method of patterning transparent conductive film, thin film... Method of patterning transparent conductive film, thin film...

2008-01-08

2008-01-08

Alanko, Anita K (Department: 1765)

Etching a substrate: processes

Forming or treating article containing a liquid crystal...

C216S039000, C216S040000, C216S041000, C216S049000, C216S055000, C216S100000, C216S108000, C438S030000, C438S038000, C438S951000, C430S020000, C257SE21025, C257SE21235

Reexamination Certificate

active

07316784

ABSTRACT:
A method of patterning a transparent conductive film adaptive for selectively etching a transparent conductive film without any mask processes, a thin film transistor for a display device using the same and a fabricating method thereof are disclosed. In the method of patterning the transparent conductive film, an inorganic material substrate is prepared. An organic material pattern is formed at a desired area of the inorganic material substrate. A thin film having a different crystallization rate depending upon said inorganic material and said organic material is formed. The thin film is selectively etched in accordance with said crystallization rate.

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