Radiation imagery chemistry: process – composition – or product th – Stripping process or element
Patent
1985-06-10
1987-05-19
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
430261, 430267, 430313, 430314, 430315, 430317, 430322, 430329, 430394, 430503, 204 15, G03C 1112, G03C 500
Patent
active
046668187
ABSTRACT:
A method for patterning a photoresist or insulating layer on a printed wiring board utilizes two photoreactive coatings comprising a photoprocessable ultraviolet (UV) sensitive layer overlaid with a thin, unexposed, undeveloped strip base silver film. A white light x-y plotter, preferably employing an octagonal aperture, is driven directly from a CAD system to expose the film on the board in the desired pattern without affecting the underlying UV sensitive layer. The film is then developed on the board and employed as an in situ mask for the underlying UV layer during exposure of the board to a UV flood lamp. After UV exposure the film is peeled off to allow conventional processing of the selectively polymerized layer. This technique produces high resolution, inspectable onboard masks in full registration using reliable low energy plotters.
REFERENCES:
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patent: 4168980 (1979-09-01), La Rossa
patent: 4327167 (1982-04-01), Tanabe
patent: 4347305 (1982-08-01), Shiba et al.
patent: 4373018 (1983-02-01), Reichmanis et al.
patent: 4469777 (1984-09-01), O'Neil
patent: 4515877 (1985-05-01), Barzynski et al.
Grandmont Paul E.
Lake Harold
Dees Jos,e G.
Kittle John E.
The Foxboro Company
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