Method of patterning resist

Details Method of patterning resist Method of patterning resist

1992-09-16

1993-10-19

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Element

430261, 430262, 430263, G03C 190

Patent

active

052544354

ABSTRACT:
A CAD driven photoplotter selectively exposes a photographic imaging layer without affecting the underlying UV sensitive resist on a substrate to make a printed wiring board, for example. The image layer is developed on the board and used as an in situ mask for the underlying UV resist during exposure to UV. After UV exposure, the image layer is peeled off to allow conventional processing of the resist. The in situ mask is preferably applied in the form of a baseless, high contrast, high gamma emulsion layer bonded to the protective cover sheet over the uncured resist. To facilitate application, the emulsion layer is carried by a release paper which is removed before photoplotting. After UV exposure, the cover sheet and emulsion layer are integrally peeled from the resist.

REFERENCES:
patent: 2326058 (1943-08-01), Nadeau
patent: 2527263 (1950-10-01), Hart
patent: 2925340 (1960-02-01), Bryce et al.
patent: 3453111 (1969-07-01), Yackel
patent: 4419675 (1983-12-01), Neumann et al.
patent: 4599295 (1986-07-01), Kondo et al.
patent: 5015553 (1991-05-01), Grandmont et al.
Chemical Abstracts, vol. 98, No. 12, Mar. 1983, p. 583, K. Shiba et al.: "Development of the high speed presensitized printing plate", Abstract 98729r.

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