Method of patterning a transparent conductor

Details Method of patterning a transparent conductor Method of patterning a transparent conductor

1990-07-19

1992-03-10

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437228, 437225, 156650, 156652, 156643, H01L 2144

Patent

active

050949780

ABSTRACT:
A method of forming a pattern of a transparent conducting film such as an indium tin oxide film, formed on the surface of a substrate including Si and being heated. A two-step etching method is employed, in which the transparent conducting film is wet-etched by an aqueous solution of a halogenide and thereafter an interfacial reacted layer generated at the interface of the transparent conducting film and substrate including Si is etched by a plasma etching method using a halogen.

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patent: 4750980 (1988-06-01), Hynecek
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