Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1990-09-28
1992-12-15
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427 98, 427123, 427125, 427586, 427581, B05D 306, B05D 512
Patent
active
051716089
ABSTRACT:
Method for improved photolithography using a laser induced metallization cess to produce a metal mask wherein a work piece surface is treated to have a predetermined pattern of at least two materials each having different electron band gaps, the treated work piece is positioned in a metallizing solution, and the workpiece is exposed to a laser beam having a wavelength corresponding to the electron gap of a selected one of the materials. The method can advantageously be used to produce ohmic contacts for microcircuit devices.
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patent: 5059449 (1991-10-01), van der Putten et al.
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Greene Richard F.
Marrian Christie R.
Pehrsson Pehr E.
Zahavi Joseph
Edelberg Barry A.
McDonnell Thomas E.
Padgett Marianne
The Unites States of America as represented by the Secretary of
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