Method of pattern forming in a photosensitive composition having

Details Method of pattern forming in a photosensitive composition having Method of pattern forming in a photosensitive composition having

1977-02-07

1980-03-04

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Dye image from radiation sensitive dye or dye former by dry...

Pretreatment processing before imaging, e.g., overall...

G03C 500, G03C 168

Patent

active

041915712

ABSTRACT:
The present invention relates to a novel light sensitive photoresist composition which is used for the photo-engraving process or for production of phosphor screen of color picture tubes. The light sensitive photoresist composition of the present invention comprises a novel water-soluble aromatic azide compound and a photo-crosslinkable water-soluble polymer.

REFERENCES:
patent: 3016306 (1962-01-01), Mader et al.
patent: 3282699 (1966-11-01), Jones et al.
patent: 3695877 (1972-10-01), Tanada et al.
patent: 3695886 (1972-10-01), Clecak et al.
patent: 3702765 (1972-11-01), Laakso
patent: 3887450 (1975-06-01), Gilano et al.
patent: 3905819 (1975-09-01), Sakurai et al.
patent: 3917794 (1974-11-01), Akagi et al.
Akagi et al., Polymer Engineering and Science, vol. 17, No. 6, 6/77, pp. 353-355.
Technical Papers, Regional Technical Conference "Polymers: Principles, Processes and Materials", Oct. 24-26, 1973, Society of Plastic Engineers, Inc.

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