Static information storage and retrieval – Floating gate – Particular biasing
Reexamination Certificate
2005-04-19
2005-04-19
Phan, Trong (Department: 2818)
Static information storage and retrieval
Floating gate
Particular biasing
C365S028000, C257S315000
Reexamination Certificate
active
06882572
ABSTRACT:
A self aligned method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes a trench formed into a surface of a semiconductor substrate, and spaced apart source and drain regions with a channel region formed therebetween. The drain region is formed underneath the trench. An electrically conductive floating gate is formed over and insulated from a portion of the channel region, with a horizontally oriented edge extending therefrom. An electrically conductive control gate is formed having a first portion disposed in the trench and a second portion disposed adjacent to and insulated from the floating gate edge.
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Hayashi, Fumihiko and Plummer, James D., “A Self-Aligned Split-Gate Flash EEPROM Cell With 3-D Pillar Structure”, 1999 Symposium on VLSI Technology Digest of Technical Papers, Center for Integrated System, Stanford University, Stanford, CA 94305, USA, pp. 87-88.
Wang Chih Hsin
Yeh Bing
DLA Piper Rudnick Gray Cary US LLP
Phan Trong
Silicon Storage Technology, Inc.
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