Method of operating a semiconductor memory array of floating...

Static information storage and retrieval – Floating gate – Particular biasing

Reexamination Certificate

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C365S028000, C257S315000

Reexamination Certificate

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06882572

ABSTRACT:
A self aligned method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes a trench formed into a surface of a semiconductor substrate, and spaced apart source and drain regions with a channel region formed therebetween. The drain region is formed underneath the trench. An electrically conductive floating gate is formed over and insulated from a portion of the channel region, with a horizontally oriented edge extending therefrom. An electrically conductive control gate is formed having a first portion disposed in the trench and a second portion disposed adjacent to and insulated from the floating gate edge.

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Hayashi, Fumihiko and Plummer, James D., “A Self-Aligned Split-Gate Flash EEPROM Cell With 3-D Pillar Structure”, 1999 Symposium on VLSI Technology Digest of Technical Papers, Center for Integrated System, Stanford University, Stanford, CA 94305, USA, pp. 87-88.

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