Method of operating a controlled atmosphere furnace

Details Method of operating a controlled atmosphere furnace Method of operating a controlled atmosphere furnace

1985-04-05

1986-04-01

Yuen, Henry C.

Heating

Processes of heating or heater operation

Including apparatus purging, cleaning or accretion preventing

432 5, 432 6, 432 18, 432 23, 432253, 414186, 414292, C21D 106, F27B 902

Patent

active

045795231

ABSTRACT:
A method of operating a controlled atmosphere furnace. To prevent the entry of oxygen into the controlled atmosphere in the chamber of the furnace, which has a furnace door for the receipt and removal of parts by means of a feeding and removal device, the device is designed to seal a vestibule located immediately in front of the furnace door when the device approaches the furnace door. The oxygen-containing ambient air thus trapped in the vestibule is then removed therefrom. The furnace door is opened, and the feeding and removal device, while still sealing the vestibule from the ambient air, then moves into the furnace chamber for feeding or removing the part which is to be heat treated.

REFERENCES:
patent: 3063878 (1962-11-01), Wilson
patent: 3107825 (1963-10-01), Reed
patent: 3197184 (1965-07-01), Navez et al.
patent: 3447788 (1969-06-01), Bornor
patent: 3722715 (1973-03-01), Young
patent: 3778221 (1973-12-01), Bloom
patent: 3852026 (1974-12-01), Johansson
patent: 3907123 (1975-09-01), Howell
patent: 4129090 (1978-12-01), Inaniwa et al.
patent: 4238122 (1980-12-01), Snyder et al.
patent: 4439146 (1984-03-01), Sugita

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